Calibre Pattern Matching is an extension to SVRF that simplifies complex rule checks required for advanced IC processes. This white paper discusses the conditions that have created the need for ...
As integrated circuit (IC) designs become increasingly complex, early-stage verification is crucial to ensure productivity and quality in design processes. The “shift left” verification approach, ...
Customers and ecosystem partners are expanding use of the Calibre® Pattern Matching solution to overcome complex integrated circuit (IC) verification and manufacturing problems. The solution ...
To keep up with the growing complexities of IC design, major semiconductor companies are adopting shift-left strategies. For verification, this means pulling much of the work into the physical design ...
This file type includes high-resolution graphics and schematics when applicable. Michael White, Director of Product Marketing, Calibre Physical Verification products, Mentor Graphics In recent years, ...
WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corp. (NASDAQ: MENT) today announced new capabilities to complement TSMC’s 20nm manufacturing processes. Enhancements to support both digital and ...
Siemens’ Calibre nmPlatform tool, is now certified for TSMC’s N2 process. Among the Siemens toolsets included in this platform and now N2 certified are Siemens’ Calibre nmDRC software, Calibre nmLVS ...
Mentor Graphics Provides Design, Verification and Test Solutions for TSMC's 20nm Design Infrastructu
WILSONVILLE, Ore.--(BUSINESS WIRE)-- Mentor Graphics Corp. (NAS: MENT) today announced new capabilities to complement TSMC's 20nm manufacturing processes. Enhancements to support both digital and ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback